Micro-machined deep silicon atomic vapor cells
نویسندگان
چکیده
Using a simple and cost-effective water jet process, silicon etch depth limitations are overcome to realize 6 mm deep atomic vapor cell. While the minimum feature size was limited 1.5 width in these first generation cells, we successfully demonstrate two-chamber geometry by including [Formula: see text] meandering channel between alkali pill chamber main interrogation chamber. We evaluate impact of conductance on introduction density during activation process mitigate glass damage contamination near Finally, highlight improved signal achievable cell compared standard 2 path length cells.
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2022
ISSN: ['1089-7550', '0021-8979', '1520-8850']
DOI: https://doi.org/10.1063/5.0114762